Si_(90)Al_(10)N_x薄膜的工艺控制及光学性能研究  

Process control and optical properties of Si_(90)Al_(10)N_x films

作　　者：陈君 周红[2] 余森江[2] 

机构地区：[1]浙江中力节能玻璃制造有限公司,浙江杭州311228 [2]中国计量学院物理系,浙江杭州310018

出　　处：《真空》2013年第4期22-25,共4页Vacuum

基　　金：国家自然科学基金项目(No.11204283)

摘　　要：通过改变磁控溅射过程中氩气与氮气(Ar/N2)的分压比,制备了多种不同厚度的Si90Al10Nx薄膜样品,并采用透射率轮廓法对样品在热处理前后的光学性能(包括折射率和消光系数)进行了测量和分析。结果表明,样品的光学性能可通过调整Ar/N2的流量比、薄膜厚度、退火条件等工艺参数加以控制。Various SioAll0Nx films with different thicknesses were prepared by changing argon/nitrogen （Ar/N2） flow ratio in magnetron sputtering process. The fihn optical properties, including refractive index and extinction coefficient, before and afler annealing were measured and analyzed by transmittance profile method. It is found that the optical properties of the films can be well controlled by changing various process parameters such as Ar/N2 flow ratio, film thickness and annealing condition.

关 键 词：磁控溅射 工艺研究 折射率 消光系数 分压比 

分 类 号：O439[机械工程—光学工程]