全薄膜电致变色元件的制备及其光学性能研究  

Preparation and Optical Performance of All-thin-film Electrochromic Devices

作　　者：杨海刚[1,2] 詹华伟[1] 张基东[1] 曹伟伟[1] 宋桂林[1] 常方高[1] 

机构地区：[1]河南师范大学物理与电子工程学院,河南省光伏材料重点实验室,新乡453007 [2]华北电力大学可再生能源学院,北京102206

出　　处：《人工晶体学报》2013年第6期1087-1091,共5页Journal of Synthetic Crystals

基　　金：河南省重点科技攻关计划项目(102102210184);河南省基础与前沿技术研究计划项目(122300410231)

摘　　要：采用磁控溅射法在单层玻璃基片上制备了由多层薄膜构成的电致变色元件,通过XRD、SEM等对薄膜及元件的晶体结构、表面形貌等进行了表征分析。采用可见光透射谱,研究了元件的电致变色性能。结果表明,较低的基片温度和较大的靶基距是采用磁控溅射制备电致变色元件的两个很重要的因素。所制备的全薄膜电致变色元件在处于漂白态和着色态时,对可见光的透过率分别达到了47.19%和15.67%,对光的透射率调节范围为31.52%。该全薄膜电致变色元件在电致变色智能窗领域具有较大的应用潜力。The all-thin-film device was fabricated by magnetron sputtering on glass substrate.The films structure was characterized by X-ray diffraction(XRD),and morphology of the films were characterized by scanning electron microscopy(SEM).The electrochromic properties of the device were measured with optical spectrophotometry.The results indicated that low the substrate temperature and large targetsubstrate distance are the important factor for the eletrochromic device preparation by magnetron sputtering.The average visible light transmittances of bleached and colored state reached 47.19% and 15.67%,respectively,and the optical transmittance modulation can reach 31.52%.The all-thin-film device has great potential to be applied in smart windows.

关 键 词：电致变色元件 透射率调节 ITO 磁控溅射 

分 类 号：O484.41[理学—固体物理]