超光滑基底表面污染微粒的激光清洗技术  

Research on Mechanism of Laser-assisted Cleaning Micron Contaminate Particulates on Substrate with Supersmooth Surface

作　　者：史兴宽[1] 徐传义[1] 王健 

机构地区：[1]西北工业大学 [2]北京航空工艺技术研究所

出　　处：《中国机械工程》2000年第10期1138-1141,共4页China Mechanical Engineering

基　　金：国家自然科学基金资助项目! ( 597750 75);航空基础科学基金资助项目! ( 97H2 50 0 7);西北工业大学"双新工程"资助项目

摘　　要：随着超光滑表面质量的不断提高 ,表面清洗已成为超光滑基片制造过程中的一项重要工序 ,并且成为影响产品合格率的关键因素。着重介绍激光清洗的特点及超光滑表面激光辅助清洗表面微细污染微粒的机理 ,并通过实验性验证 。Along with continuous improvement of supersmooth surface quality,surface cleaning has become an important operation in the process of substrate with supersmooth surface, and also become one of key factors which influence on product qualification. This paper introduces feature of laser cleaning and Mechanism of Laser-assisted Cleaning Micron Contaminate Particulates on Substrate with Supersmooth Surface. By experiments of this method, very exciting results are obtained.

关 键 词：超光滑表面 激光清洗 污染微粒 微电子工业 

分 类 号：TN405[电子电信—微电子学与固体电子学]