等离子体化学气相沉积TiN涂层的后热处理技术研究  

Studies of the Inverse Treatment of PCVD TiN Coatings

作　　者：赵程[1] 彭红瑞[1] 谢广文[1] 李世直[1] 

机构地区：[1]青岛化工学院等离子体表面技术研究所,青岛266042

出　　处：《真空科学与技术》2000年第5期366-369,共4页Vacuum Science and Technology

摘　　要：为了提高等离子体化学气相沉积 (PCVD)涂层的质量 ,改善基体材料的机械性能 ,更好地发挥PCVD硬质涂层的使用效果 ,采用了先沉积后热处理的新工艺。结果表明 ,热处理温度对PCVD TiN涂层的化学成分、显微结构和性能有较大的影响。随着处理温度的提高 ,涂层的结晶度得到大幅度的改善 ,涂层内的杂质氯含量降低 ,涂层的 (2 0 0 )晶面距减小 ,但在 90 0℃时 ,PCVDTitanium nitride coating grown by plasma chemical vapor deposition (PCVD) was annealed at temperatures ranging from 800 to 1100 ℃.Its structures were studied with X ray diffraction,scanning electron microscopy and energy dispersive X ray fluorescence.The results show that annealing temperature significantly affects the mechanical properties,the chemical composition and the structures of the coating.For example,as annealing temperature increases,the chlorine content and the spacing of (200) plane decrease.Its micro hardness was also studied.At 900 ℃,the micro hardness of the coating has a minimum value.We suggest that the inverse treatment of PCVD TiN may improve both the mechanical properties of the coated steels and quality of the coating.

关 键 词：TIN涂层 后热处理 PCVD 金属表面强化 

分 类 号：TG174.442[金属学及工艺—金属表面处理]