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出 处:《Chinese Physics B》2013年第8期563-567,共5页中国物理B(英文版)
基 金:supported by the National Natural Science Foundation of China(Grant Nos.61076079 and 61274092);the Doctoral Program Fund of the Ministry of Education of China(Grant No.20090203110012);the Major Program and State Key Program of the National Natural Science Foundation of China(GrantNo.60890191)
摘 要:Photoluminescence (PL) measurement is used to study the point defect distribution in a GaN terahertz Gunn diode, which is able to the degrade high-field transport characteristic during further device operation. PL, secondary ion mass spectroscopy (SIMS), transmission electron microscope (TEM), and capacitance-voltage (C-V) measurements are used to discuss the origin of point defects responsible for the yellow luminescence in structures. The point defect densities of about 1011 cm-2 in structures are extracted by analysis of C-V characterization. After thermal annealing treatment, diminishments of point defect densities in structures are efficiently demonstrated by PL and C-V results.Photoluminescence (PL) measurement is used to study the point defect distribution in a GaN terahertz Gunn diode, which is able to the degrade high-field transport characteristic during further device operation. PL, secondary ion mass spectroscopy (SIMS), transmission electron microscope (TEM), and capacitance-voltage (C-V) measurements are used to discuss the origin of point defects responsible for the yellow luminescence in structures. The point defect densities of about 1011 cm-2 in structures are extracted by analysis of C-V characterization. After thermal annealing treatment, diminishments of point defect densities in structures are efficiently demonstrated by PL and C-V results.
关 键 词:GaN terahertz Gunn diode point defect PHOTOLUMINESCENCE CAPACITANCE-VOLTAGE
分 类 号:TN31[电子电信—物理电子学]
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