无牙颌单侧上颌骨缺损种植修复设计的三维光弹应力分析  

Three dimensional photoelastic analysis for designs of bilateral implant prosthesis in edentulous unilateral maxillary defect

作　　者：周涛[1] 赵铱民[1] 陈勇[1] 张铁[1] 

机构地区：[1]第四军医大学口腔医学院修复科,710032

出　　处：《实用口腔医学杂志》2000年第4期305-307,共3页Journal of Practical Stomatology

摘　　要：目的：探讨采用双侧种植体植入修复无牙颌单侧上颌骨缺损的可行性，并优化其设计。方法：采用三维光弹应力分析法对应用种植杆卡式附着体赝复体的上颌骨缺损患者载荷下的支持组织进行应力观察和分析。结果：双侧种植修复设计的支持组织和种植体的应力分布明显优于单侧种植修复设计。结论：无牙颌单侧上颌骨缺损的修复应采用双侧种植长桥架设计。To explore the stress distribution and its changing regularity with different number of the implants and the framework design in bilateral implant prosthesis in the edentulous unilateral maxillary defect. Methods: Three-dimensional photoelastic analysis was used to analyse the effects of different framework on supporting tissue. Results: The stress of bilateral implant prosthesis on supporting tissue was smaller and distributed more evenly than that of unilateral. Conclusion: To gain better support and retention the prosthsis in edentulous unilateral maxillary defect bilateral implant connected framework should be sued.

关 键 词：无牙颌单侧上颌骨缺损 骨内牙种植 光弹性试验 

分 类 号：R783[医药卫生—口腔医学]