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作 者:吕镖[1,2] 胡振峰[3] 汪笑鹤[2] 徐滨士[2]
机构地区:[1]东北大学材料与冶金学院,沈阳110819 [2]装甲兵工程学院再制造技术重点实验室,北京100072 [3]装甲兵工程学院机械产品再制造国家工程研究中心,北京100072
出 处:《中国表面工程》2013年第4期66-71,共6页China Surface Engineering
基 金:国家自然科学基金(51005244);国家重点基础研究发展计划(973计划)(2011CB013403);武器装备预研基金(9140C850201110C8501)
摘 要:采用阴极移动电镀技术在电流密度为1~13A/dm2时制备镍镀层。利用扫描电镜(SEM)、X射线衍射仪(XRD)、X射线应力衍射仪以及硬度计等手段,研究电流密度对镍镀层的表面形貌、结晶取向、孔隙率、内应力和硬度的影响。结果表明:镍镀层的织构和性能随电流密度的变化而改变。当电流密度低于7A/dm2时,镀层表面球形颗粒较为粗大、孔隙率较高,在为4A/dm2时,镀层具有最低的拉应力约110 MPa;当电流密度为7A/dm2时,镀层表面球形颗粒均匀细小,具有最小的表面粗糙度Ra 0.69μm,最小的孔隙率0.08个/cm2以及最高的硬度330HV0.1;当电流密度大于7A/dm2时,镀层的表面粗糙度增加,择优取向由(200)晶面向(220)晶面发生转变,电流密度达到13A/dm2时,(220)晶面的织构系数达到了85.4%。At the current density of 1-13 A/dm2, Ni coatings were prepared by movingcathod electroplating technology. The effects of current density on surface morphology, crystallization orientation, porosity, internal stress and microhardness of Ni electroplating were investigated by scanning electron microscopy (SEM), X-ray diffraction analysis (XRD), X-ray stress tester, micro hardness tester, etc. The results show that Ni coatings have different texture and properties at different current densities. When the current density is below 7 A/dm2, the coatings show coarser surface with spherical particles and higher porosity. However, at the current density of 4 A/dm2, Ni electroplating has the lowest tensile stress about 110 MPa. At the current density of 7 A/dm2, the coatings shows uniformity and fine surface spherical particles, and has the lowest surface roughness of Ra 0.69 μm, lowest porosity of 0.08 dot/cm2 and highest microhardness of 330 HV0.1. When the current density is above 7 A/dm2, the surface roughness of Ni coatings increases, and preferred orientation changes from (200) crystal face to (220) crystal face. When the current density attains 13 A/dm2, and the texture coefficient of (220) crystal face reaches 85.4%.
分 类 号:TG174.441[金属学及工艺—金属表面处理] TQ153.12[金属学及工艺—金属学]
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