射频磁控溅射沉积Al/Al_2O_3纳米多层膜的结构及性能  

Microstructures and Properties of Magnetron Sputtered Al/Al_2O_3 Multilayers

作　　者：朱雪婷[1,2] 孙勇[1,2] 郭中正[1,2] 段永华[1,2] 吴大平[1,2] 

机构地区：[1]云南省新材料制备与加工重点实验室,昆明650093 [2]昆明理工大学材料科学与工程学院,昆明650093

出　　处：《真空科学与技术学报》2013年第5期477-482,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家863计划项目(2009AA03Z512);云南省自然科学基金重点资助项目(2004E0004Z);云南省新材料制备与加工重点实验室开放基金资助(ZDS201012B)

摘　　要：运用射频磁控溅射技术在Si（100）基片及40Cr钢基体上制备了调制周期λ=60 nm,调制比η=0.25~3的Al/A12O3纳米多层膜。通过X射线衍射、X射线光电子能谱、扫描电镜、原子力显微镜、维氏显微硬度仪及MFT-4000多功能材料表面性能测试仪对多层膜的结构、硬度、膜基结合强度及摩擦性能进行了研究。结果表明：Al/A12O3多层膜中Al层呈现（111）择优取向,A12O3层以非晶形式存在,多层膜呈现良好的调制结构。薄膜与衬底之间的结合强度较高,均在40 N左右,摩擦系数均低于衬底的摩擦系数,表明Al/A12O3多层膜具有一定的减摩作用。η=0.25的Al/A12O3多层膜具有最高的硬度值（16.1GPa）,摩擦系数最低（0.21）,耐磨性能最好。The nano-structured Al/Al2O3 multi-layers were deposited by RF magnetron sputtering on substrates of Si （100）and 40Cr steel.The impacts of the growth conditions on the multi-layers were evaluated. The microstructures and mechanical properties of the films were characterized with X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy,atomic force microscopy and conventional mechanical probes. The results show that the Al/Al2O3 multi-layers, with an interfacial adhesion about 40 N, considerably decreased the friction coefficient, and increased its sur- face hardness and wear-resistance. The highest hardness and lowest friction coefficient of the Al/Al2O3 multi-layers de- posited with a modulation ratioη = 0.25,were found to be 16.1 GPa and 0.21 ,respectively.

关 键 词：射频磁控溅射 AL Al2O3纳米多层膜 调制比 硬度 摩擦系数 

分 类 号：TB43[一般工业技术] TG146.4[一般工业技术—材料科学与工程]