真空镀膜领域射频叠加直流偏压技术研究  

Research of RF superimposed DC bias in field of vacuum coating

作　　者：陈树君[1] 王海亮[1] 刘松[1] 李振东[2] 王建新[1] 徐晶晶[1] 

机构地区：[1]北京工业大学机械工程与应用电子技术学院,北京100124 [2]中国农业机械化科学研究院,北京100083

出　　处：《机电工程》2013年第8期919-923,955,共6页Journal of Mechanical & Electrical Engineering

基　　金：国家重点基础研究发展计划("973"计划)资助项目(6113112KY-2011-2)

摘　　要：针对射频辉光放电过程中射频电源与直流偏压电源的叠加问题,通过分析阻抗匹配网络和高频屏蔽网络的工作原理,利用阻抗匹配网络将射频电源的高频能量最大效率的输出到真空室,利用高频屏蔽网络将射频电源的高频能量进行屏蔽的同时将直流偏压电源的低频能量最大效率的输出到真空室。对射频辉光放电过程中射频电源、直流偏压电源以及真空室模型进行了系统的电路仿真,实现了射频电源与直流偏压电源的叠加,利用自制的射频电源与直流偏压电源系统进行了真空镀膜实验,证实了双电源系统的可行性。研究结果表明,利用阻抗匹配网络和高频屏蔽网络能够很好地将射频电源与直流偏压电源进行叠加,由双电源系统产生的带有负偏压的高频能量能够对真空镀膜工艺产生影响,有助于探索新的镀膜工艺。Aiming at the superposition of radio frequency（RF） power and DC bias power for the RF glow discharge process,by analyzing the operating principle of impedance matching network and high frequency shielding network, the impedance matching network can maximize the high frequency energy that transferred to the vacuum chamber, the high frequency shielding network can shield the high frequency energy and make the most of low frequency energy that transferred to the vacuum chamber. The RF power, DC bias power and vacuum chamber were simulated as a system in RF glow discharge process, the superposition of RF power and DC bias power was achieved, the vacuum coating experiment was carried out by self-made RF power and DC bias power system, the feasibility of the dual power system was confirmed. The results indicate that the impedance matching network and the high frequency shielding network make the superposition of RF power and DC bias power well, the high frequency energy with negative bias voltage produced by double power system can affect vacuum coating process and help to explore new coating process.

关 键 词：射频电源 直流偏压 阻抗匹配 真空镀膜 

分 类 号：TN702[电子电信—电路与系统] TQ153.7[化学工程—电化学工业]