化学气相沉积制备三维石墨烯的扩散沉积机理  

The Diffusion and Deposition Mechanism of the Three-Dimensional Graphene Networks Prepared by Chemical Vapor Deposition

作　　者：胡国新[1] 唐波[1] 

机构地区：[1]上海交通大学机械与动力工程学院,上海200240

出　　处：《工程热物理学报》2013年第9期1779-1782,共4页Journal of Engineering Thermophysics

基　　金：国家自然科学基金(No.51076094)

摘　　要：由于其优异的电学和光学性质，石墨烯引起了科学界的广泛关注。随着对石墨烯研究的深入，最近三维（3D）石墨烯的制备成为热点。本文采用CVD方法，以泡沫镍为模板制备了高质量的2-4层的3D石墨烯。另外，本文对此3D石墨烯的生长机理进行了研究。Graphene attracts intensity attention due to its excellent electrical and optical properties. With the development of the graphene research, preparation the three-dimensional graphene networks becomes the focus in recent years. By using the Chemical Vapor Deposition, the high quality 3D graphene networks from two to four layers were fabricated with a foam nickel as a template. Moreover, the growth mechanism of the material was studied.

关 键 词：三维石墨烯 化学气相沉积 生长机制 

分 类 号：O781[理学—晶体学]