201无镍不锈钢溅射沉积金属钛膜研究  

Titanium film sputtering depostion on 201 stainless steel free of Ni

作　　者：蓝德均[1] 黄双华[2] 

机构地区：[1]攀枝花学院生物与化学工程学院,四川攀枝花617000 [2]攀枝花学院土木与建筑工程学院,四川攀枝花617000

出　　处：《有色金属科学与工程》2013年第4期23-28,共6页Nonferrous Metals Science and Engineering

基　　金：四川省科技支撑计划资助项目(2008GZ0188)

摘　　要：采用常温直流磁控溅射法在廉价201无镍不锈钢表面沉积了纯钛薄膜.通过XRD和SEM分析了201上钛薄膜的结构和形态受沉积条件的影响.结果表明,在溅射功率为78.4 W时钛薄膜由紧密排列的柱状晶构成,但功率过大薄膜反而疏松.多种工艺参数下,钛薄膜具有高度的择优取向,但其择优取向的晶面并不固定.XRD结果还表明:由于钛原子的渗入,基底会发生较严重的晶格畸变.并探讨了以沉积量表征膜厚的可能性及工艺参数对薄膜沉积量的影响.Ti film was deposited at the room temperature by DC magnetron sputtering on low-cost 201 stainless steel free of Ni. The effects of deposition conditions on the structure and appearance of Ti film on 201 stainless steel were analyzed through XRD and SEM. The results showed that the film microstructure was closely correlated with the deposition parameters. The closely aligned cyberlink crystal was observed at 78.4 W of sputtering power, but porosity was being produced at stronger power. High orientation was determined by XRD but lattice plane with the orientation was not exclusive with different variable process parameters. It was also determined by XRD that the more serious lattice distortion of the base was found because of Ti atom infiltration. Moreover, the possibility that the film thickness could be characterized by the deposition quantity and the effects of parameters on the deposition quantity were also discussed.

关 键 词：201无镍不锈钢 磁控溅射 钛薄膜 择优取向 沉积量 

分 类 号：TF764[冶金工程—钢铁冶金] TG146.23[一般工业技术—材料科学与工程]