多束动态混合注入技术制备TiN厚膜的工艺、结构及性能研究  

A study on process, structure and characteristics of TiN thick film prepared by MBMI technology

作　　者：任春生[1] 牟宗信[1] 刘振民[1] 龙振湖[1] 杨黎明 

机构地区：[1]大连理工大学三束材料改性国家重点实验室,大连116024

出　　处：《核技术》2000年第10期678-682,共5页Nuclear Techniques

摘　　要：在多束动态混合(MBMI)-注入系统上利用MBMI技术制备TiN膜,XRD分析表明,N+入射角度α(°)、氮钛原子到达比RN/Ti、 N2分压PN2对膜生长的择优取向及相结构有影响;性能研究结果表明。高的入射离子能量Ei、基体温度Ts以及合适的RN/Ti对TiN膜的显微硬度HK和膜-基结合力都有正面影响。TiN thick films were prepared by multi-ion-beam dynamic mixing implanting (MBMI) technology and their structure and characteristics were analyzed by XRD, microhardness analysis and scratch test. The structure analysis results indicate that the phase structure of TiN films are affected by the implantation angle of nitrogen ion, the nitrogen to titanium atom ratio and the pressure of nitrogen gas. The performance tests show that higher temperature of substrate Ts and suitable RN/Ti are important for increasing the microhardness (HK) of TiN films and the stickiness between TiN film and substrate.

关 键 词：氮化钛膜 制备 结构 性能 MBMI IBAD 

分 类 号：TG174[金属学及工艺—金属表面处理] O484.1[金属学及工艺—金属学]