18～20nm正入射宽带多层膜的研究  

Study on 18～20 nm Broadband Multilayer at Normal Incidence

作　　者：柯常军[1] 王占山[2] 万重怡[1] 曹健林[2] 

机构地区：[1]中国科学院电子学研究所,北京100080 [2]中国科学院长春光机所应用光学国家重点实验室,长春130022

出　　处：《中国激光》2000年第11期1016-1018,共3页Chinese Journal of Lasers

基　　金：国家自然科学基金!(编号 :6 97780 2 6 )

摘　　要：采用随机数的方法在 18～ 2 0 nm波段设计了积分反射率最大的宽带多层膜 ,理论上得到了高于周期膜系 8%的积分反射率 ,同时带宽与视场范围有明显的展宽 ,并用磁控溅射法进行了初步制备。对反射率的相对测试表明 ,与周期膜系相比 ,非周期多层膜的带宽展宽 ,但峰值反射率略有降低。膜厚控制是实验的难点。In this paper, a better random method used for improving the light integrated reflectance in the 18~20 nm spectral region of a soft X ray multilayer has been developed, a 8% increase in reflectance is obtained. The multilayer is fabricated by magnetron sputtering. The reflectance comparative measurement are used for testing the multilayer. The results demonstrate that the layer thickness disorder yields band broadening and wider view field with respect to periodic multilayer, but accompanied with a reduction in reflectance peak. Techniques of control layer thickness is the keystone of experiment.

关 键 词：软X射线 宽带多层膜 磁控溅射 反射率 

分 类 号：O484[理学—固体物理]