弱吸收单面薄膜光学特性的表征方法  

Characterization of optical properties of weak absorption thin film

作　　者：刘华松[1] 傅翾 王利栓 姜玉刚[1] 冷健[1] 庄克文[1] 季一勤[1] 

机构地区：[1]天津津航技术物理研究所天津市薄膜光学重点实验室,天津300192 [2]二炮驻天津地区军事代表室,天津300192

出　　处：《红外与激光工程》2013年第8期2108-2114,共7页Infrared and Laser Engineering

基　　金：国家自然科学基金(61235011);天津市科委项目(12JCQNIC01200;13JCYBJC17300)

摘　　要：光谱法是测量光学薄膜光学性能的重要方法之一,能够直接表征薄膜-基底系统的光学特性,如:反射率、透过率和吸收率。通过研究薄膜-基底系统的光传输特性,推导出在基底具有弱吸收的一般条件下薄膜-基底系统反射率、透射率和吸收率的表达式,确定了通过测量单面和双面抛光基底及其薄膜特性间接获得薄膜单面光学特性的方法;在实验中使用Lambda-900分光光度计对熔融石英基底的HfO2薄膜进行了测试,并通过测量误差分析,薄膜的单面反射率误差为1.00%,单面透过率的误差为0.601%。研究结果表明文中方法可适用于各类薄膜单面特性的表征与评价。Spectrum method is one of the important testing technique by which the optical properties （reflectance, transmittance and absorptance） of the thin film-substrate system could be obtained directly. The expressions for reflectance, transmittance and absorptance in case of weak absorption existing in substrate were derived by researching the optical transport characteristics of thin film-substrate system. The optical properties of thin film could be calculated by testing the properties of thin films deposited on single sided polishing substrate and double sided polishing substrate indirectly. HfO2 thin film deposited on fused silica substrate was measured by Lambda-900 spectrophotometer. And the error analysis shows that the error of single side reflectance is 1.00%, however, the error of single side transmittance is about 0.601%. It can be concluded that the characterization and evaluation of various types of single side thin film could be obtained by the method in this paper.

关 键 词：光学特性 单面反射率 单面透过率 

分 类 号：O484[理学—固体物理]