偏压对挡板电弧离子镀TiAlN涂层性能的影响  

Effect of Bias Voltage on the Properties of TiAlN Coating by Shielded Arc ion Plating

作　　者：冯长杰[1] 胡弦[1] 江鸢飞[1] 

机构地区：[1]南昌航空大学,江西南昌330063

出　　处：《南昌航空大学学报（自然科学版）》2013年第2期63-68,共6页Journal of Nanchang Hangkong University(Natural Sciences)

基　　金：国家自然科学基金(51005111);江西省创新基金(YC2011-S102)

摘　　要：采用电弧离子镀技术和挡板,在1Cr11Ni2W2MoV不锈钢基体上沉积TiAlN涂层。圆形挡板放置于Ti50Al50合金靶和试样架之间,尺寸与靶材直径相同。沉积实验在不同偏压下进行,分别为0V、150V、350V、550V。采用SEM/EDS、XRD研究挡板作用下偏压对涂层微观结构、成分的影响,通过显微硬度计和摩擦磨损试验研究偏压对TiAlN涂层力学性能的影响。结果表明,随着偏压的增大,TiAlN涂层中Ti含量上升,Al含量下降,涂层由两相结构向单相结构转变。涂层表面熔滴数量随偏压增加而减少,涂层硬度上升,沉积速率在-150V偏压时达到最大。摩擦磨损测试结果表明,-150V偏压时涂层摩擦系数和磨损量最小,耐磨性最好。TiAlN coating was deposited on 1 Cr11Ni2W2MoV stainless steel by arc ion plating with a shielded plate in the system. The rounded plate with the same diameter as the target was placed between the TiSOAI.50 alloy target and the substrate holder. The deposi- tion was carried on under the bias voltage of 0V, 150V, 350V, 550V, respectively. The composition, microstructure, mechanical and tribological properties of coatings were characterized by SEM（EDS） , X -ray diffraction, microhardness tester and wear experiments. The results show that Ti content increases while Al content goes down in the TiAlN coating when increasing the bias voltage, the phase composition of TiAIN changes from two mixed structures to single one. moreorer, the macroparticles on the surface of coatings reduce apparently and the microhardness increases significantly. When the voltage reaches - 150V, the TiAlN coating has the biggest deposi- tion rate while has the smallest friction coefficient and wear volume, which shows the outstanding tribological properties.

关 键 词：电弧离子镀 TIALN 挡板 偏压 摩擦学性能 

分 类 号：TG174[金属学及工艺—金属表面处理]