分流片对矩形平面磁控溅射阴极磁场的影响  

Effect of a Deflector to Magnetic Field of Rectangular Plane Magnetron Sputtering Cathode

作　　者：张超群[1] 屠友明[1] 李险峰[1] 

机构地区：[1]中国建材国际工程集团有限公司,上海200063

出　　处：《建材世界》2013年第4期132-136,共5页The World of Building Materials

基　　金："十二五"国家科技支撑计划资助项目(2011BAE14B01)

摘　　要：分流片对磁控溅射阴极的磁场分布有较为重要的影响,对提高阴极的溅射速率、利用率及膜层的均匀性有着重要的意义。该文分析了分流片的大小、形状、位置对磁场形成的影响,总结了分流片在设计中应注意的问题。The deflector has an important influence on the magnetic field distribution, and it＇s very important to irn prove the cathode sputtering rate, utilization and the uniformity of film layer. This paper analyzes the influence of the deflector to magnetic field from deflector＇s size, shape, location. And this paper summarizes the problems that should be paid attention to in the deflector＇s design.

关 键 词：磁控溅射 阴极 分流片 马鞍形磁场 

分 类 号：TB43[一般工业技术]