液相等离子体电沉积制备类金刚石薄膜  

Preparation of diamond-like carbon thin film by liquid plasma electrodeposition

作　　者：李巧梅[1,2] 罗北平[1] 黄锋[1,2] 许友[1] 余红霞[1] 武鹄[1] 

机构地区：[1]湖南理工学院化学化工学院,湖南岳阳414006 [2]湘潭大学化工学院,湖南湘潭411105

出　　处：《电镀与涂饰》2013年第10期1-4,共4页Electroplating & Finishing

基　　金：湖南省自然科学基金重点项目(11JJ2028);湖南省科技计划项目(2011GK3165);岳市科发(2011)22号

摘　　要：采用等离子体电沉积法在水-乙醇电解液中制备了类金刚石（DLC）薄膜，工艺条件为：乙醇和水的体积比4：1，KCl3g／L，电流密度500～800mA／cm2，电压1500V，时间4h。研究了电流密度和电极间距对DLC薄膜的显微硬度、厚度和表面形貌的影响。结果表明，电流密度和电极间距都对电极表面气泡区域厚度、均匀程度、稳定性及电极表面电荷密度有较大影响，适宜的电流密度和电极间距分别为600～700mA／cm2和6～10mm。采用较佳工艺制得的DLC膜表面平整均匀，为多晶结构，摩擦因数约为0．13。A diamond-like carbon （DLC） thin film was prepared from H2O-C2H5OH electrolyte by plasma electro- deposition under the following conditions： alcohol-to-water volume ratio 4：1, KCl 3 g/L, voltage 1 500 V, current density 500-800 mA/cm2, and time 4 h. The effects of current density and electrode spacing on the microhardness, thickness, and surface morphology of DLC thin film were studied. The results show that both current density and electrode spacing have significant impact on the thickness, uniformity, and stability of blister area as well as the electric charge density on electrode surface. The suitable current density and electrode spacing are 600-700 mA/cm2 and 6-10 mm, respectively. The DLC film obtained under the optimal process condition is smooth, uniform, and poly- crystalline, and has a friction factor of 0.13.

关 键 词：类金刚石薄膜 等离子体电沉积 电流密度 极间距 

分 类 号：TQ153.3[化学工程—电化学工业]