反面水浴斜曝光法制作三维微透镜阵列  

Fabrication of the Three-Dimensional Micro Lens Array by Reverse Water Bath Tilt-Exposure Method

作　　者：吴淑娟[1,2] 张斌珍[1,2] 王伟[1,2] 王春水[1,2] 

机构地区：[1]中北大学电子测试技术重点实验室,太原030051 [2]中北大学仪器科学与动态测试教育部重点实验室,太原030051

出　　处：《微纳电子技术》2013年第10期646-651,共6页Micronanoelectronic Technology

基　　金：国家自然科学基金面上项目(61176115);新世纪优秀人才支持计划资助项目(130951862)

摘　　要：提出一种反面水浴斜曝光的方法用于制作主光轴平行于基底的微透镜阵列。已有的水浴斜曝光法中,由于基底处光刻胶获得曝光剂量较少而不易充分交联固化,在显影时出现与基底粘附不牢固,导致成品率较低。反面水浴斜曝光的方法,是通过光刻以及溅射工艺在玻璃基底上复制掩膜图形,匀光刻胶之后,采用玻璃基底朝上、光刻胶朝下的曝光方法,此方法得到的光刻胶结构很容易牢固地固定在玻璃基底上,显影时不易脱落,提高了成品率,同时有利于后续倒模复制工艺。用该方法获得的透镜直径约为200μm。The reverse water bath tilt-exposure method to fabricate micro lens array with the horizontal primary optical axis was presented. For the existing water bath tilt-exposure method, the photoresist near the substrate is not easy to fully crosslinking and curing due to the insufficient exposure, the adhesion of the photoresist and substrate is not strong during the developing step,and then the yield is low. While in the reverse water bath tilt-exposure method, the mask pattern was copied on the glass substrate through the lithography and sputtering process, after spinning photoresist, through the method for placing the glass substrate upturn and the photoresist down-turn. The obtained photoresist structure is easy to stick on the glass substrates firmly, and not easy to drop during the developing step, the yield is improved, and it is very beneficial for the subsequent reverse mould replication process. The diameter of lens obtained with the method is about 200 μm.

关 键 词：三维 微透镜阵列 主光轴水平 反面水浴曝光 SU-8光刻胶 

分 类 号：TH703[机械工程—仪器科学与技术]