Increase in Generation of Poly-Crystalline Silicon by Atmospheric Pressure Plasma-Assisted Excimer Laser Annealing  

作　　者：Alexander Gredner Christoph Gerhard Stephan Wieneke Kai Schmidt Wolfgang Viol 

机构地区：[1]Laboratory for Laser and Plasma Technologies, University of Applied Sciences and Arts, G6ttingen 3 7085, Germany [2]Application Center for Plasma and Photonic, Fraunhofer Institute for Surface Engineering and Thin Films, GOttingen 37085,Germany [3]Coherent Laser Systems GmbH & Co. KG, Gottingen 37079, Germany

出　　处：《材料科学与工程（中英文B版）》2013年第6期346-351,共6页Journal of Materials Science and Engineering B

关 键 词：等离子体辅助 准分子雷射 激光退火 多晶硅 常压 生成效率 激光传播 协同作用 

分 类 号：O484.1[理学—固体物理] TN873.93[理学—物理]