ZrCoRE薄膜的结构调控与吸气性能研究  

Structure Modification and Sorption Characteristics of ZrCoRE Getter Films

作　　者：卜继国[1] 毛昌辉[1] 张艳[1] 张心强[1] 尉秀英[1] 杜军[1] 

机构地区：[1]北京有色金属研究总院,北京100088

出　　处：《稀有金属材料与工程》2013年第9期1889-1892,共4页Rare Metal Materials and Engineering

摘　　要：运用扫描电镜、扫描原子探针、X射线衍射仪和动态法分析了高硼硅玻璃表面改性对ZrCoRE薄膜结构和吸气性能的影响。结果表明,ZrCoRE薄膜的纳米组织受衬底表面的影响较大,其表面粗糙度和结构无序度随衬底粗糙度增加而增大;经300℃激活30 min后,Ⅰ-型薄膜(Ra=5 nm)吸气性能随时间下降较快,Ⅱ-型(Ra=7 nm)、Ⅲ-型(Ra=59nm)及Ⅳ-型薄膜(Ra=125 nm)的吸气速率依次增大并具有平稳的吸气平台,Ⅳ-型薄膜吸气性能最好。The effect of substrate surface treatments on structures and sorption properties of ZrCoRE thin film getters were analyzed by SEM, SPI, XRD and dynamic gas sorption tests. The results show that nanostructures of ZrCoRE thin films are strongly affected by the substrate surface. Both surface roughness and structure disorder degree grow with the increase of substrate surface roughness. After activation at 300 ℃ for 30 rain, the sorption property of I-type getter film （Ra=5 nm） decreases quickly with the time. While II-type （Ra=7 rim）, III-type （Ra=59 nm） and type-iv（Ra=125 rim） getter films exhibit stable gas sorption plateaus and increasing sorption speeds in sequence, IV-type getter film shows the best sorption property.

关 键 词：ZrCoRE 吸气薄膜 射频磁控溅射 结构调控 吸气性能 

分 类 号：TB43[一般工业技术]