In_2O_3基透明导电薄膜的生长技术  

The Growth Technology of In_2O_3 Transparent Conductive Oxide Films

作　　者：徐莉[1] 修显武[2] 李玉国[2] 

机构地区：[1]山东电子职业技术学院,济南250200 [2]山东师范大学,济南250014

出　　处：《价值工程》2013年第30期36-38,共3页Value Engineering

摘　　要：透明导电氧化物(TCO)同时具有良好的金属导电性和较高的可见光透过率,近年来在光电器件领域,特别是平板显示和薄膜太阳能电池上得到广泛的应用。其中In2O3基薄膜应用技术最为成熟。本文主要报道In2O3基薄膜的制备与退火处理的研究现状。The transparent conductive oxide （TCO） films have the combination of good metallic conductivity and high transmittance in the visible spectra, so these films were widely used in all types of flat panel displays and thin films solar cells. The well-known In2O3 based films are the most intense researched in nowadays. This paper reports the development of the producing technique and annealing properties in laboratories.

关 键 词：真空蒸镀 溅射 脉冲激光沉积 溶胶-凝胶 退火 

分 类 号：Q939.5[生物学—微生物学]