0.8～1μm分步重复投影光刻机主要机构控制系统研制  

The Design of Control System for Submicron Wafer Stepper

作　　者：罗正全[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《电子工业专用设备》2000年第4期30-34,共5页Equipment for Electronic Products Manufacturing

摘　　要：传输片、预对准、调平及预调焦系统是分步重复投影光刻机的重要组成部分 ,其精度和运行可靠性对分步重复投影光刻机的整机性能指标将产生重大影响。介绍了 0 8～ 1 μm分步重复投影光刻机传输片、预对准、调平及预调焦控制系统的组成及控制软件 ;分析了预对准、机械手上片、调平及预调焦的精度和运行可靠性 ,并给出了研制结果。Wafer transporting,pre-aligning,levelling and pre-focusing system is an important part of wafer stepper. It's accuracy and reliability may fatally impact the characteristics and specification of the wafer stepper Constructs of the system and control software which is using in the system are introduced in the paper The accuracy of the wafer transporting,pre-aligning,levelling and pre-focusing system and reliability of operation are also discussed In the end of the paper,design results are given out

关 键 词：传输片 调平 分步重复投影光刻机 机构控制系统 

分 类 号：TN305.7[电子电信—物理电子学]