光栅多普勒纳米干涉仪  

Nanometer Interferometer Using Grating Doppler Effect

作　　者：林德教[1] 蒋弘[1] 殷纯永[1] 

机构地区：[1]清华大学精密仪器与机械学系,北京100084

出　　处：《中国激光》2000年第12期1080-1084,共5页Chinese Journal of Lasers

基　　金：国家自然科学基金! ( No.598750 51);国家教委博士点基金

摘　　要：用横向塞曼激光作光源构成的 Dammann光栅多普勒干涉仪有利于降低热膨胀影响 ,测量过程中干涉臂长不变、便于克服折射率漂移 ,具有 0 .7nm分辨率。分析了光栅退偏效应的影响 ,与差动双频激光干涉仪进行了比对。实验结果表明 ,光栅间距光学 8细分等间隔 ,当光栅栅距为 2 0μm时其测量非线性误差不超过 2 5nm。A Dammann grating interferometer using transverse Zeeman laser as light resource is developed in this paper. It takes advantages of reducing the effect of thermal expansion. Drift of the air refraction index can be easily conquered due to equivalent beam length. It is an attractive configuration with resolution of 0.7 nm. The error caused by the depolarization effect of the grating is analyzed. Calibration experiment between this grating interferometer and a differential dual-frequency interferometer has been implemented. The experimental results show that the equal divisions of the grating pitch by 8 times via optical system and the nonlinearity error is no more than 25 nm when the grating pitch equals 20 μm.

关 键 词：光栅多普勒干涉仪 纳米测量 退偏效应 

分 类 号：TH744.3[机械工程—光学工程]