Electric field driven plasmon dispersion in AlGaN/GaN high electron mobility transistors  

Electric field driven plasmon dispersion in AlGaN/GaN high electron mobility transistors

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作  者:谭仁兵 秦华 张晓渝 徐文 

机构地区:[1]Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences [2]Institute of Semiconductors, Chinese Academy of Sciences [3]University of Chinese Academy of Sciences [4]Institute of Solid State Physics, Chinese Academy of Sciences

出  处:《Chinese Physics B》2013年第11期524-527,共4页中国物理B(英文版)

基  金:Project supported by the National Basic Research Program of China(Grant No.2009CB929303);the Knowledge Innovation Program of the Chinese Academy of Sciences(Grant Nos.Y0BAQ31001 and KJCX2-EW-705);the National Natural Science Foundation of China(Grant Nos.61271157,61107093,and 10834004)

摘  要:We present a theoretical study on the electric field driven plasmon dispersion of the two-dimensional electron gas (2DEG) in A1GaN/GaN high electron mobility transistors (HEMTs). By introducing a drifted Fermi-Dirac distribution, we calculate the transport properties of the 2DEG in the A1GaN/GaN interface by employing the balance-equation approach based on the Boltzmann equation. Then, the nonequilibrium Fermi-Dirac function is obtained by applying the calculated electron drift velocity and electron temperature. Under random phase approximation (RPA), the electric field driven plas- mon dispersion is investigated. The calculated results indicate that the plasmon frequency is dominated by both the electric field E and the angle between wavevector q and electric field E. Importantly, the plasmon frequency could be tuned by the applied source-drain bias voltage besides the gate voltage (change of the electron density).We present a theoretical study on the electric field driven plasmon dispersion of the two-dimensional electron gas (2DEG) in A1GaN/GaN high electron mobility transistors (HEMTs). By introducing a drifted Fermi-Dirac distribution, we calculate the transport properties of the 2DEG in the A1GaN/GaN interface by employing the balance-equation approach based on the Boltzmann equation. Then, the nonequilibrium Fermi-Dirac function is obtained by applying the calculated electron drift velocity and electron temperature. Under random phase approximation (RPA), the electric field driven plas- mon dispersion is investigated. The calculated results indicate that the plasmon frequency is dominated by both the electric field E and the angle between wavevector q and electric field E. Importantly, the plasmon frequency could be tuned by the applied source-drain bias voltage besides the gate voltage (change of the electron density).

关 键 词:two-dimensional electron gas PLASMON A1GAN/GAN high electron mobility transistor 

分 类 号:TN32[电子电信—物理电子学]

 

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