热等静压对钨基体表面等离子喷涂钽层组织及性能的影响  

Effect of Hot Isostatic Pressing on Microstructure and Mechanical Properties of Plasma Sprayed Tantalum Coating on Tungsten Substrate

作　　者：魏少红[1] 纪全[1] 张锐强[1] 蒋驰[2] 

机构地区：[1]中国科学院高能物理研究所,北京100049 [2]四川材料与工艺研究所,四川绵阳621000

出　　处：《材料保护》2013年第11期6-8,5,共3页Materials Protection

摘　　要：目前,国内鲜有钨块包覆钽材的报道。于氩气气氛保护下在钨材表面等离子喷涂钽层,然后对其进行热等静压处理。采用扫描电镜观察涂层热等静压前后微观形貌,采用能谱仪测试其成分,采用X射线衍射仪测试其相结构,采用力学试验测试其力学性能。结果表明:等离子喷涂钽层与钨材界面处含有一定氧,且其分布不均匀,钽涂层由Ta和Ta6O组成;等离子喷涂钽层呈层状结构,经热等静压处理后,涂层内孔隙减小,致密度从91.2%提高到98.8%,涂层抗拉结合强度由19.4 MPa提高到22.5 MPa,硬度由517.8 HV提高到626.6 HV。Tantalum coating was prepared on tungsten substrate by plasma spraying under Ar protective atmosphere. Resultant Ta coating was then treated by hot isostatic pressing. A scanning electron microscope was performed to observe the microstructure of the Ta coatings before and after hot isostatic pressing. Moreover,the elemental composition of the coating was analyzed by energy dispersive spectrometry,its phase structure was analyzed by X-ray diffraction,and its mechanical properties were evaluated based on mechanical tests. Results showed that there existed a small amount of oxygen at the coating-substrate interface,and oxygen was non-uniformly distributed at the interface. Besides,Ta coating consisted of Ta and Ta 6 O and had lamellar net-like structure. Moreover,hot isostatic pressing contributed to reduce the amount of pores in the coating. Namely,after hot isostatic pressing,the compactness of the Ta coating was increased from 91. 2% to 98. 8%,the tensile strength was increased from 19. 4 MPa to 22. 5 Mpa,and the hardness was in-creased from 517. 8 HV to 626. 6 HV.

关 键 词：等离子喷涂 热等静压 钽涂层 钨基体 致密度 力学性能 

分 类 号：TG174.442[金属学及工艺—金属表面处理]