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作 者:白红艳[1] 涂洁磊[1] 肖祥江[1] 付蕊[1] 赵沛坤[1] 李烨[1]
机构地区:[1]云南师范大学太阳能研究所,云南省农村能源工程重点实验室,教育部可再生能源材料先进技术与制备重点实验室,昆明650092
出 处:《人工晶体学报》2013年第10期2059-2064,共6页Journal of Synthetic Crystals
基 金:国家高技术研究发展计划项目(2011AA050512)
摘 要:采用真空电子束蒸发法制备TiO2/SiO2双层减反射膜,实现宽波段范围内的低反射率,以满足砷化镓三结太阳电池对入射光的需求。主要研究了基片温度、电子束流和充氧量对TiO2、SiO2单层膜性能(膜层厚度、折射率)的影响。研究过程中,按照三因素两水平的正交实验进行,用分光光度计对TiO2、SiO2薄膜样品的折射率进行测试。实验结果显示,两种氧化物介质膜的折射率均随基片温度和束流的升高而增加,随氧压的升高而降低,工艺参数对TiO2膜性能影响较大。The TiO2/SiO2 double-layer antireflecting films for triple-junction GaAs solar cell were fabricated by electron beam evaporation, which can achieve low reflectivity in the wide wavelength range to meet the demand of the GaAs triple junction solar cells on the incident. Growth parameters ( substrate temperature ,electron beam and oxygen content) on the monolayer SiO2 and TiO2 coating were studied and the influence on the monolayer coating's performance (thickness, refractive index)were analyzed. In the process of study, we took the method of three-factor two-level orthogonal experiment, the refractive index of TiO2, SiO2 thin film samples were tested with a spectrophotometer. The experimental results showed that two oxide compound medium membrane 's refractive index elevates as the temperature of substrate increasing, as the oxygen tension decreasing. Especially, electron beam and oxygen content affected the performance of the TiO2 coating more.
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