Ni/Zr-Co-Re堆栈层薄膜吸气剂的吸气性能及Ni作用机理研究  

Gas absorption property and mechanism of Ni of the stack Ni/Zr-Co-Re getter film

作　　者：田士法 毛昌辉[1] 张心强[1] 朱君[1] 崔航[1] 

机构地区：[1]北京有色金属研究总院先进电子材料研究所,北京100088

出　　处：《功能材料》2013年第21期3208-3211,共4页Journal of Functional Materials

基　　金：国家自然科学基金青年基金资助项目(51202013)

摘　　要：采用磁控溅射的方法制备了带有Ni保护层和Zr-Co-Re(Re代表稀土元素)主体层的堆栈层薄膜吸气剂。通过X射线光电子能谱仪(XPS)分析了薄膜吸气剂内部O元素的含量分布,研究了薄膜吸气剂中Ni层的防氧化作用和机理。研究表明:(1)Ni/Zr-CoRe堆栈层薄膜吸气剂在160℃保温3h的条件下可以有效激活,并具有高于Zr-Co-Ni单层薄膜吸气剂的吸气性能;(2)Ni保护层降低了吸气剂的被氧化程度,促进了表面吸附的H2分子的解离和扩散。Non-evaporable getter （NEG） stack layer thin films including protective layer of Ni and subject layer of Zr-Co-Re （Re indicating rare earth element） were prepared by RF magnetron sputtering. XPS was used to measure the content distribution of O element in the thin film getters and the anti-oxidation mechanism was in- vestigated. The following results were concluded. （1） the stack Ni/Zr-Co-Re getter film activated at 160℃ for 3h shows higher gas absorption property than Zr-Co-Re single layer film; （2） the protective layer of Ni could not only protect the getter film from being oxidated but also improve the dissociation and diffusion of Hz molecule.

关 键 词：吸气剂 Ni保护层 薄膜 吸气性能 

分 类 号：TN104.8[电子电信—物理电子学]