二甲基乙烯基乙氧基硅烷等离子体聚合  

PLASMA POLYMERIZATION OF VINYLDIMETHYLE-THOXYSILANE

作　　者：周和平[1] 周茂堂[1] 王世才[1] 陈捷[1] 

机构地区：[1]中国科学院长春应用化学研究所

出　　处：《辐射研究与辐射工艺学报》1991年第4期243-245,242,共4页Journal of Radiation Research and Radiation Processing

摘　　要：在外部电极电容耦合式辉光放电装置中进行了二甲基乙烯基乙氧基硅烷(VDMES)的等离子体聚合,考察了压力、功率以及基片距离对聚合速率的影响。用红外光谱和X射线光电子能谱(XPS)等方法研究了聚合物的结构,并研究了聚合物的热稳定性及表面性能。In a capacitively coupled discharge apparatus with external electrodes,vinyldimethylethoxysilane were polymerized, and the effects of system pressure, dischargepower and substrate distance on the polymerization rate were studied. The polymer structure was researched by IR spectroscopy and XPS, some properties of the polymersuch as thermostability and surface characteristics were also determined.

关 键 词：VDMES 有机硅聚合物 等离子体聚合 

分 类 号：O634.41[理学—高分子化学]