Cu离子掺杂TiO_2光催化材料的研究进展  

Research Progress of Cu Doped TiO_2-based Photocatalysts

作　　者：宋兵[1] 郑水林[1] 李慧[1] 孙建之[1] 侯会丽[1] 

机构地区：[1]中国矿业大学(北京)化学与环境工程学院,北京100083

出　　处：《硅酸盐通报》2013年第11期2259-2262,共4页Bulletin of the Chinese Ceramic Society

摘　　要：随着对光催化材料研究的深入,金属掺杂在近几年的研究中发展迅速,其应用前景备受关注。文章结合近年来Cu掺杂TiO2光催化材料的研究情况,分析了Cu掺杂的掺杂机理,综述了Cu掺杂和Cu+X共掺杂TiO2光催化材料在制备,检测和性能表征方面发展现状,并对该研究方向的发展前景进行了展望。With the further development of photocatalysts in the past years, more researches on metal doping are being made due to the promising application of TiO2-based photocatalysts. Thus this paper, based on the current situation in Cu-doped TiO2, analyzed the doping mechanism of Cu, reviewed recent development in preparation, detection and property characterization of Cu-doped TiO2 and Cu ＋ X-doped TiO2. Additionally, the paper prospected the development of this research area.

关 键 词：TiO2光催化材料 CU掺杂 掺杂机理 共掺杂 

分 类 号：TB39[一般工业技术—材料科学与工程]