射频离子束辅助溅射镀膜设备的研制  

Development of RF Ion Beam Assist Sputter

作　　者：陈特超[1] 龙长林[1] 胡凡[1] 刘欣[1] 王慧勇[1] 

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2013年第11期1-3,32,共4页Equipment for Electronic Products Manufacturing

摘　　要：介绍了一种用于氧化物薄膜制备的射频离子束辅助溅射镀膜设备,阐述了设备原理、组成、特点以及试验结果。通过使用射频离子源和射频中和器,解决了采用热灯丝离子源的同类设备中灯丝易被氧化的关键问题,适合于氧化物薄膜制备。A new type of RF ion beam assist sputtering deposition equipment applied to the oxide tttm is introduced. The principle of equipment, components and characteristics of equipment, and experimental results are presented. Compared with equipment using hot filament ion source, this equipment solves the key problem of suitable for oxide film deposition by way of using RF ion beam source and RF neutralizer.

关 键 词：离子束 溅射 薄膜 射频离子源 溅射靶 

分 类 号：TN305.92[电子电信—物理电子学]