离子束辅助及退火后处理对氦-镉激光器反射镜输出功率的影响  

Influence of Ion-Beam Assistance and Annealing on Output Power of He-Cd Laser Reflector

作　　者：崔潇[1] 陶春先(指导)[1] 洪瑞金[1] 张大伟[1] 

机构地区：[1]上海理工大学光电信息与计算机工程学院,上海市现代光学系统重点实验室,上海200093

出　　处：《中国激光》2013年第11期181-185,共5页Chinese Journal of Lasers

基　　金：国家自然科学基金(61176085;11105149);国家科技支撑计划(2011BAF02804);国家重大科学仪器设备开发专项(2011YQ15004003);上海市教委曙光项目(11SG44);上海市超精密光学加工与检测服务平台建设(11DZ2290301);上海市重点学科建设项目(S30502)

摘　　要：为了制备高输出功率的441.6nm氦-镉激光反射镜,研究了氧离子束辅助工艺及退火后处理对ZrO2单层膜及441.6nm氦-镉激光器ZrO2/SiO2反射膜的影响。利用紫外-可见分光光度计测试了薄膜样品的反射光谱及吸收光谱;通过原子力显微镜测试了薄膜表面的粗糙度。测量及分析结果表明:氧离子束辅助沉积能够提高激光反射镜的反射率并形成致密的薄膜结构,但是由于引入的杂质缺陷提高了薄膜的吸收率从而使得激光的输出功率变小;退火处理消除了吸附于薄膜表面的杂质气体、水分,输出功率相比于退火前有了大幅度的提高。Aiming to manufacture high output power of high reflective mirror, the influence of 02 ion-beam assistance and annealing treatment to Zr02 films and ZrO2/SiO2 high reflection films used for 441.6 nm He-Cd laser is studied. The effects of different deposition processes and post-treatment on the optical and roughness of the samples are characterized by ultraviolet-visible spectrophotometer and atomic force microscopy, respectively. The results show that 02 ion-beam assisted deposition increases the reflectivity and form a dense film structure, but the output power of laser is smaller due to the introduction of impurity defects to improve the absorption rate of film; the output power of annealed films has been improved significantly than films without annealing while impurity gas and water on film surface are eliminated.

关 键 词：薄膜 激光反射镜 输出功率 离子束辅助 退火 

分 类 号：O433.4[机械工程—光学工程]