溅射功率对金属锰膜光学性质的影响  

Influence of sputtering power on the optical properties of metal manganese film

作　　者：唐华杰[1] 张晋敏[1] 金浩[1] 邵飞[1] 胡维前 谢泉[1] 

机构地区：[1]贵州大学电子信息学院,贵州大学新型光电子材料与技术研究所,贵阳550025

出　　处：《物理学报》2013年第24期318-323,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:61264004);贵州省自然科学基金(批准号:黔科合J字[2013]2119);贵州省优秀教育科技人才省长基金(批准号:黔省专合字[2011]40);贵州省教育厅“125”重大科技专项项目(批准号:黔教育合重大专项字[2012]003);贵州省科技创新人才团队建设项目(批准号:黔科合人才团队(2011)4002);贵州省科技攻关项目(批准号:黔科合GY字(2011)3015)资助的课题~~

摘　　要：采用磁控溅射方法在Si(111)基片上制备金属锰膜,用椭圆偏振光谱在入射光子能量为2.0—4.0 eV范围内研究了溅射功率对薄膜光学性质的影响.利用德鲁得-洛伦兹色散模型对椭偏数据进行拟合,结果表明在测量范围内随溅射功率增加薄膜的折射率减小;消光系数随入射光子能量增加先增加后减小,在3.0 eV附近处出现极大值,并且极大值所处的位置随溅射功率增加而向低能方向移动,这主要与溅射沉积的锰薄膜的质量有关,且随溅射功率的增加薄膜的消光系数逐渐趋近于金属锰的数值.研究结果还表明溅射功率的增加减少了薄膜中的空隙,有利于薄膜的生长.In this paper, spectroscopic ellipsometry with an incident photon energy range of 2.0–4.0 eV is used to investigate the optical properties of Mn films deposited on silicon substrates at different sputtering powers. The ellipsometric data are analyzed by Drude and Lorenz oscillators dispersion model. The results show that the refractive index of the film decreases with the increase of the sputtering power. The extinction coefficient of the Mn film increases when the energy of photons is less than 3.0 eV and decreases when the energy of photons is in a range of 3.0–4.0 eV, and it arrives at an extremum at about 3.0 eV. The extremum shows a red-shift with the sputting power increasing from 60 to 100 W, which is dependent on the quality of the Mn film. With the increase of sputtering power, the extinction coefficient of the film approaches to that of metal manganese. The results also imply that the voids in the film decrease with the increase of the sputtering power, which is conducive to the growth of the films.

关 键 词：磁控溅射 金属锰膜 椭圆偏振光谱 德鲁得-洛伦兹色散模型 

分 类 号：O484.41[理学—固体物理]