表层氮化硅掺氧对单银高透Low-E性能的改善  

Performance Improvement of Single-layer-silver Low-E by Oxygen Doping in Surface Si_3N_4 Layer

作　　者：贾绍辉 张淮凌 孙徐兴 刘涌[2] 韩高荣[2] 

机构地区：[1]威海蓝星玻璃股份有限公司,山东威海264211 [2]浙江大学材料科学与工程系硅材料国家重点实验室,浙江杭州310027

出　　处：《材料科学与工程学报》2013年第6期799-802,818,共5页Journal of Materials Science and Engineering

基　　金：国家"十二五"科技支撑计划资助项目(2011BAE14B02)

摘　　要：低辐射玻璃要求具有低的辐射率和高的可见光透射比。目前较为常见的单银高透Low-E产品具有优良的采光和隔热性能,但是膜层机械性能普遍较差,对于玻璃深加工厂的加工设备要求高。通过对单银高透Low-E表面覆层Si3N4薄膜进行特定比例的掺氧处理,形成Si3Nx Oy层,改变了膜层表面的特性,增强了其加工的机械性和稳定性,显著提升了单银高透Low-E产品的可加工性。表层改性对于提升单银高透Low-E产品性能,推进其在节能建筑领域的广泛应用具有重要意义。Low-emissivity （Low-E） coated glass requires low emissivity and high transmittance of visible light. Single silver Low-E coated glass has been widely used for its excellent transmittance and heat isolation properties. However, it usually suffers from poor mechanical properties, leading to the requirements of high- level equipment and complex manufacture process. In the present study, the surface layer, Si3N4, of single silver Low-E coated glass has been successfully modified by doping oxygen to form Si3NxOy films. The results show that the mechanical properties and the structural stabilities of the surface are improved as well as the machinability. These results are very important to optimize the performance of Low-E coated glass and helpful for spreading and popularizing of Low-E coated glass in energy-saving building field.

关 键 词：Low—E 氮化硅 氧掺杂 

分 类 号：TQ171.724[化学工程—玻璃工业] TQ171.738[化学工程—硅酸盐工业]