光栅刻划刀架系统参数对光栅刻线弯曲影响  

Influence of the parameters of a grating ruling tool system on grating line bend

作　　者：冯树龙[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033

出　　处：《长春工业大学学报》2013年第6期635-639,共5页Journal of Changchun University of Technology

基　　金：国家重大科研装备研制项目(ZBYZ2008-1)

摘　　要：研究了光栅刻划刀架系统结构、重量及其稳定性对光栅性能指标的影响。有限元分析表明,对刻划刀架系统中的刻划刀架进行减重或使刻划刀架系统两侧的重量对称,均可降低光栅刻线弯曲。光栅刻划对比实验结果表明,配重侧有配重块的刻划刀架系统与配重侧无配重块的刻划刀架结构相比,刻线弯曲幅值由91.2nm降低至58.9nm,这与有限元分析结果在趋势上较为一致。Influence of some parameters such as structural symmetry, weight and stability of grating ruling tool systems on grating quality is studied. We find that reducing the weight of ruling tool and making it symmetry on both side can decrease the bend of grating line with finite element analysis method. The experimental results show that shows that the bend attitude go from 91.2 nm down to 58.9 nm when the counterweight is added, whieh is accordance with the theoretical results.

关 键 词：光栅刻划机 刀架系统 刻线弯曲 

分 类 号：O433.4[机械工程—光学工程]