CrAlN/TiAlN纳米多层膜的微结构及其性能研究  

Study on Microstructure and Properties of CrAlN/TiAlN Nanostructured Multilayers

作　　者：苏波[1] 钟春良[1] 罗兰娥[1] 

机构地区：[1]湖南工业大学理学院,湖南株洲412007

出　　处：《湖南工业大学学报》2013年第5期13-17,共5页Journal of Hunan University of Technology

基　　金：湖南工业大学大学生研究性学习和创新性实验计划基金资助项目(湖工大教字[2013]19-23);湖南省教育厅科研基金资助项目(12C0096);湖南工业大学自然科学基金资助项目(2012HZX14)

摘　　要：采用磁控反应溅射法制备了不同调制周期的CrAlN/TiAlN纳米多层膜,并通过X射线衍射仪、显微硬度计、扫描电镜分析了调制周期对多层膜的微结构、力学性能和高温抗氧化性能的影响。结果表明:CrAlN/TiAlN纳米多层膜共格外延生长,呈现CrAlN(或TiAlN)面心立方结构,且呈(111)择优取向;CrAlN/TiAlN纳米多层膜在某些调制周期出现硬度异常升高的超硬度效应;CrAlN/TiAlN纳米多层膜比CrAlN,TiAlN单层膜具有更好的高温稳定性,高温时仍具有较高的硬度。CrAIN/TiAIN multilayer films with different modulation periods were deposited by reactive magnetron sputtering. The impacts of modulation periods to the microstructures, mechanical properties and oxidation resistance at high temperature for the films were characterized by X-ray diffraction （XRD）, micro hardness tester and scanning electron microscopy （SEM）. It was found that the films took the fcc-CrAlN （or fcc-TiAIN） structure with a （111） preferential orientation, which resulted from epitaxial growth. The CrAIN/TiAIN multilayer films reached an unusual hardness at a certain modula-tion periods. The films had better high temperature stability than the monolayer of CrAIN and TiAIN, and showed higher hardness even in high temperature.

关 键 词：CrAIN TiAIN纳米多层膜 磁控溅射 微结构 硬度 高温稳定性 

分 类 号：TG174.44[金属学及工艺—金属表面处理]