氮气氛下金刚石薄膜生长过程中的光发射谱研究  

Optical Emission Spectroscopy for Hot Filament Diamond Growth Process with Nitrogen Addition

作　　者：李灿华[1] 廖源[2] 常超[2] 王冠中[1] 马玉蓉[2] 方容川[2] 

机构地区：[1]中国科技大学结构分析开放研究实验室,中国科技大学物理系合肥230026 [2]中国科技大学物理系,合肥230026

出　　处：《无机材料学报》2001年第1期81-86,共6页Journal of Inorganic Materials

基　　金：八六三计划新材料领域资助项目!(715-002-0032);国家自然科学基金资助!项目(59771022)

摘　　要：利用原位光发射谱对衬底附近的化学气相性质进行了研究．研究表明，氮气的引入使得金刚石生长的气相化学和表面化学性质发生了很大变化．含氮基团的萃取作用提高了金刚石表面氢原子的脱附速率，从而提高了金刚石膜的生长速率．而含氮基团的选择吸附使金刚石（１００）取向变得化学糙化，这种化学糙化使得（１００）晶面生长速率远大于其它晶面，最终使金刚石薄膜呈现（１００）织构．还利用化学气相沉积方法研究了氮气浓度对金刚石生长的影响，结果与光发射谱分析是一致的．Optical emission spectra were applied to detect the chemical radicals in the system. It is shown that the additional nitrogen makes the chemical radicals and surface activity of diamond films change tremendously, Nitrogenous species abstract the atomic hydrogen on the diamond surface and speed up the desorption fate of H, so as to promote the diamond films deposition. Further more, the selective absorption of nitrogenous species causes the (100) facets chemical roughening, which makes the growth rate of (100) facet higher than that of other Facets and leads to the presence of (100) textured diamond films. The effects of nitrogen addition in CH4/W-2 gas mixtures on morphology, quality and growth rate of polycrystalline diamond films prepared by hot filament chemical vapor deposition (HFCVD) were also studied. The results agree with the analysis of the optical emission spectra.

关 键 词：热丝CVD 光发射谱 含氮基团 金刚石薄膜生长 

分 类 号：O484.1[理学—固体物理] O613.71[理学—物理]