氮化硅窗口在大气环境软X射线接触成像中的应用研究  

Si_3N_4 Windows Used in Study of Soft X-ray Contact Imaging in Air

作　　者：徐向东[1] 洪义麟[1] 霍同林[1] 陶晓明[1] 蒋诗平[1] 傅绍军[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《真空科学与技术》2001年第1期47-50,共4页Vacuum Science and Technology

摘　　要：成功地研制了将软X射线引入大气中的氮化硅窗口。根据具体数据 ,对大气环境下软X射线接触成像的水窗软X射线衰减进行了估算 ;给出成像实验结果并观察到了氮化硅膜上的微粒图像叠加在样品图像上的现象。所得结果与理论估算相一致。即使用 3 2nm的软X射线时 ,同一样品在大气环境中所需的曝光量约为真空中的两倍。这些结果将十分有益于大气环境下的软X射线接触显微术及软X射线扫描透射显微术的研究。The silicon nitride windows have been successfully fabricated for sealing vacuum and transmitting soft X ray to air.The attenuation of water window soft X rays through a silicon nitride film,air and water contained in samples was calculated using the experimental data.The experimental results show that the exposure of good imaging in air is about twice as much as that in vacuum for the same sample with 3 2 nm X rays,in good agreement with the theoretical calculation.The soft X ray contact image of a fly's wing in air ,adding the images of particles in the silicon nitride film,was recorded simultaneously in photoresist.These should be very useful to the soft X ray contact microscopy in air and the soft X ray scanning transmission microscopy.

关 键 词：软X射线 线性吸收系数 接触成像 氮化硅窗口 显微成像 显微术 

分 类 号：O434.14[机械工程—光学工程]