多光谱氮氧化铪薄膜光学特性研究  

Optics Characterization of Multi-Spectrum HfON Thin Film

作　　者：董茂进[1] 王多书[1] 熊玉卿[1] 王济洲[1] 李晨[1] 张玲[1] 

机构地区：[1]兰州空间技术物理研究所表面工程技术重点实验室,甘肃兰州730000

出　　处：《光学学报》2013年第B12期230-234,共5页Acta Optica Sinica

基　　金：表面工程技术重点实验室基金项目（9140C540301110C5402）

摘　　要：采用离子束辅助反应蒸发的方法沉积3-5 μm和7-10 μm具有高透射率的多光谱氮氧化铪薄膜，通过控制沉积速率改变膜层中N、O化学计量比，从而研究氮氧化铪中N、O化学计量比不同对薄膜光学性能的影响规律。随着沉积速率从0.8 nm/s减小到0.05 nm/s，氮氧化铪薄膜的折射率从1.95降低到1.80，而消光系数从1×10^-3增大到8×10^-3，禁带宽度从5.62 eV减小到5.5 eV。在多光谱硫化锌基片上镀制增透膜和氮氧化铪薄膜后测试光谱曲线，3.0-5.0 μm波段的透射率为82.16%，7.0-10.0 μm波段的透射率为82.84%，结果表明，氮氧化铪薄膜在中波和长波红外区域具有高的透射率。Using ion beam assisted reactive deposition method, high transmittance multispectral hafnium oxynitride films at 3 - 5 μm and 7-10 μm are prepared. The deposition rate is changed to adjust the nitrogen oxynitride stoichiometric ratio, so as to investigate the effect of the variation of nitrogen oxygen stoichiometric ratio on optical properties of hafnium oxynitride film. With the deposition rate reducing from 0.8 nm/s to 0.05 nm/s, hafnium oxynitride film refractive index decreases from 1.95 to 1.80, and the extinction coefficient increases from 1×10^-3 to 8×10^-3, the band gap width decreases from 5.62 eV to 5.5 eV. Antireflection coatings and hafnium oxynitride film are coated on the multi-spectral ZnS substrates. After computing spectral curves, transmittance at 3.0-5.0 μm is 82.16%, and transmittance at 7.0-10.0 μm is 82.84%. The results show that hafnium oxynitride films have a high transmittance in middle-wave and long-wave infrared region.

关 键 词：薄膜 氮氧化铪 光学特性 多光谱 

分 类 号：O433.3[机械工程—光学工程]