JGP-560B磁控溅射仪基片台的改进  

Improvements of Substrate Holder of the JGP-560B Magnetron Sputtering System

作　　者：张兴元[1] 何国庆[1] 刘园园[1] 黄佳木[1] 

机构地区：[1]重庆大学材料科学与工程学院,重庆400045

出　　处：《实验室研究与探索》2013年第12期72-74,共3页Research and Exploration In Laboratory

基　　金：国家科技支撑计划项目(2012BAJ20B03)

摘　　要：针对JGP-560B型磁控溅射仪存在基片台可放置基片的数量及尺寸有限、同批不同样品成分的一致性难以保证等问题,将设备的基片挡板转盘改进成了一次可放置较多数量基片,并能实现连续旋转的新基片台。结果表明:通过优化可编程控制器端口的接线,既保留了JGP-560B磁控溅射仪的原设计功能,又实现了挡板转盘的软件可控连续旋转,且可通过LED灯指示挡板转盘的旋转状态;在挡板转盘上,根据靶离子的有效溅射范围设计的5个基片位,满足了一次最多可放置20片载玻片基片的实验需求。该技术改进有效满足了多基片一次性沉积均一多元薄膜的实验要求,为JGP-560B磁控溅射仪基片台的技术改进提供了改进思路和有效方案。There are several limitations in the JGP-560B magnelron spultering system, for of subslrates which can be placed on the substrale hohler are limiled and the cmnposition e example, the number and size onsisteney of different samples in the same batch is hard to be guaranteed. To solve this, a new substrate hohter, which can hoht more glass substrales and has /he function of continuous rotation, has been designed through modifying the original substrate-haffle plate. The results show that： on one hand, the substrate-baffle plate in JGP-560B magnetron sputtering system can not only retain the original design but also achieve the controllable eominuous rotation function hy optimizing the ports connection of the programmable logic controller; on the olher hand, the composition consistency of samples in one hatch can be guaranteed due to the increase in the number of samples that can be placed on the hohter. These technological improvements, which can ensure the composition consistency of films in nmhi-target and muhi-substrate eo-spt,｜tering processes, provide ideas and specific teehniques for improving the substrate hohter of JGP-560B magnetron sputtering system.

关 键 词：磁控溅射 多靶共溅 基片台 基片挡板转盘 可编程控制器 

分 类 号：TB43[一般工业技术]