工艺参数对PECVD TiN镀层性能的影响  

The Influence of Processing Parameters on the Properties of PECVD TiN Coating

作　　者：张平余[1] 刘洪[1] 丛秋滋[1] 张绪寿[1] 王秀娥[1] 顾则鸣[1] 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑开放研究实验室

出　　处：《固体润滑》1991年第1期57-62,共6页

摘　　要：本文考察了工艺参数对等离子体增强化学气相沉积(PECVD)TiN镀层性能的影响,并且研究了镀层的摩擦学性能与其物理机械性能及结晶学特征之间的关系。结果表明,当N/H比为1、Ti/N比为21、沉积温度为400℃和离化电压为1500V时,镀层具有较好的机械性能及耐磨性能。X—射线衍射分析表明,在本试验条件下所获镀层均为(200)面择优取向。作者指出,要制取理想的TiN镀层,离化电压应不低于1500V,沉积温度必须高于300℃。The influence of processing parameters on the properties of plasma enhanced chemical vapor deposition (PECVD) TiN coating have been studied, the relation bet ween the physic-mechanical properties. crystallinities and tribological characteristic are presented. The results show that the properties of PECVD TiN coating are affected by the gas composition inletting chamber,deposition temperature and ionization voltage.The coatings have better mechanical properties and wear-resistance when the ratio of N2 flow to H2 flow is 1, the ratio between TiCl4 flow and N2 flow is 21, the deposition temperature is 400℃ and ionization voltage is 1500V. The X-ray diffraction analysis showed that the deposited coating is of strong preferential orientation of(200) in this work. In order to prepare the ideal TiN coating the ionization voltage must be maintained above 1500V, and the deposition temperature more than 300℃.

关 键 词：化学气相沉积 TIN镀层 工艺参数 

分 类 号：TG174.442[金属学及工艺—金属表面处理]