高纯六氟化钨制备工艺研究  

Preparation Technology of High Purity Tungsten Hexafluoride

作　　者：陈志刚 陈财华 冯振雷 

机构地区：[1]厦门钨业股份有限公司,福建厦门361026

出　　处：《中国钨业》2014年第1期43-47,共5页China Tungsten Industry

摘　　要：介绍了利用氟气与钨粉为原料制备高纯六氟化钨的工艺方法和设备体系。其过程是利用电解槽电解氟氢化钾制取氟气,并采用氟化钠吸附配合深冷工艺纯化氟气,净化后的氟气与固定床里的钨粉在一定温度条件下反应合成初级六氟化钨,通过低温冷凝回收,收集的初级六氟化钨经过固化后抽真空排轻等方法进行初步提纯,然后将初步提纯的产品蒸馏至填料式精馏塔内进行深度提纯,经过多步提纯后的成品六氟化钨纯度可达99.999%以上。This paper introduces the processing and equipment system for high-purity tungsten hexafluoride using fluorine gas and tungsten powder as raw materials. Electrolytic cell is applied to prepare fluorine gas by electrolyzing the potassium bifluoride. Sodium fluoride adsorption with cryogenic mixture is used to purify the fluorine gas. Purified fluorine gas reacts with tungsten powder to synthesize the impure tungsten hexafluoride in the fixed bed reactor at a certain temperature. The impure tungsten hexafluoride is obtained by low-temperature condensation. Curing and vacuuming technologies are performed on impure tungsten hexafluoride use to remove the volatile impurity. Filler type distillation column is utilized to further purify by monitoring the distillation products intermittently to prevent unqualified products collection. The results show that the purity of tungsten hexafluoride reaches 99.999%.

关 键 词：制备 六氟化钨 冷凝 提纯 

分 类 号：TQ136.13[化学工程—无机化工] TF114[冶金工程—冶金物理化学]