碳化锆镀层的化学气相沉积  

Chemical vapor deposition of zirconium carbide coating

作　　者：朱钧国[1] 杜春飙[1] 张秉忠[1] 杨冰[1] 彭新立[1] 

机构地区：[1]清华大学核能技术设计研究院,北京102201

出　　处：《清华大学学报（自然科学版）》2000年第12期59-62,共4页Journal of Tsinghua University(Science and Technology)

基　　金：国家"八六三"高技术项目 !(86 3- 6 14- 0 2 )

摘　　要：碳化锆是一种重要的高熔点、高强度和耐腐蚀的高温结构材料。为了进一步发展和开发利用高温气冷堆 ,用碳化锆镀层替代碳化硅镀层制备新型的包覆燃料颗粒。采用化学气相沉积的方法 ,选用四氯化锆、丙烯、氢和氩的反应体系 ,在直径为 5 5 m m的流化床沉积炉中制备碳化锆镀层。为控制四氯化锆粉末的流量研制了专用的送粉装置。研究表明碳化锆镀层的密度随沉积温度而变化 ,反应气体中碳锆的原子数比值和氢氩流量比值影响碳化锆镀层性能和结构。在沉积温度 16 0 0℃左右 ,反应气体中碳锆的原子数比值小于0 .5和氢氩流量比值大于 1.0时 。Zirconium carbide, ZrC, is an important high temperature structural material with very high melting point, excellent strength and good corrosion resistance. ZrC layers are used instead of silicon carbide (SiC) layers for fabricating a new type of coated fuel particle for the high temperature gas cooled reactor (HTGR). This paper describes the ZrC coating carried out in the 55mm diameter fluidized bed coating furnace by chemical vapor deposition, using a gas mixture of propylene (C 3H 6), zirconium tetrachloride (ZrCl 4), hydrogen (H 2) and argon (Ar). A special powder feeder controlled the ZrCl 4 flowrate. The density of the ZrC layer changed with deposition temperature. The effects of the atomic ratio of carbon and zirconium and the flowrate ratio of hydrogen and argon in the coating gas on the characteristics and structure of ZrC coating layer were studied. A high density ZrC coating layer can be deposited at a deposition temperature of about 1600℃, an atomic ratio of carbon and zirconium less than 0.5 and a mass flowrate ratio of hydrogen and argon of more than 1.0 in the coating gas.

关 键 词：化学气相沉积 碳化锆 流化床 四氯化锆 高温结构材料 包覆燃料颗粒 镀层密度 镀层相成分 高温气冷堆 

分 类 号：TL424[核科学技术—核技术及应用] TL352.26