采用溶胶凝胶协同自组装与光刻相结合的方法在反蛋白石结构薄膜中引入二维缺陷  

Introduction of two-dimensional defects in inverse opalfilms by means of planar lithography and sol-gel co-assembly methods

作　　者：李龙[1] 王鸣[1] 倪海彬[1] 沈添怿 

机构地区：[1]南京师范大学物理科学与技术学院,江苏省光电技术重点实验室,南京210023

出　　处：《物理学报》2014年第5期171-177,共7页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:61178044;91123015);2012江苏省产学研前瞻性联合研究项目(批准号:BY2012005);江苏省研究生创新计划(批准号:CXZZ12_0405)资助的课题~~

摘　　要：采用溶胶凝胶协同自组装与光刻相结合的方法,在光子晶体反蛋白石结构中引入缺陷,通过溶胶凝胶协同自组装方法在硅片上垂直沉积胶体晶体复合薄膜,把BP212正性光刻胶均匀旋涂在复合薄膜上,通过曝光、显影等光刻工艺,把掩膜版图案复制在复合薄膜上,用此样品再次垂直沉积一层复合薄膜,使图案被复合薄膜覆盖.最后去除胶体微球与光刻胶图案,从而在反蛋白石结构中引入缺陷,用扫描电子显微镜对样品进行表征.分析了光刻胶图案对胶体微球排列的影响.By applying planar lithography and sol-gel co-assembly methods, the designed two-dimensional defects were introduced in inverse opal films. Composite colloidal crystal films which can turn into inverse opal films after calcination were fabricated by sol-gel co-assembly method. Photoresist patterns produced by planer lithograph either on silicon or composite colloidal film/silicon substrate were used as the sacrificial structure to form the designed defects. To form the embedded defects in inverse opal films, a layer of composite colloidal crystal film was assembled on the photoresist patterns. After calcination, both PS spheres and photoresist were removed, and the designed defects were introduced in the inverse opal films. Infiuence of the photoresist patterns on self-assembled PS particles was also characterized.

关 键 词：胶体晶体 反蛋白石薄膜 光刻 缺陷结构 

分 类 号：O484[理学—固体物理]