抗蚀剂组合法制造DFB激光器λ/4相移光栅  

Fabrication ofλ/4-shifted Grating for DFB Lasers by Positive and Negative Photoresist Mothod

作　　者：杨新民 

机构地区：[1]武汉电信器件公司

出　　处：《光通信研究》1991年第4期34-37,共4页Study on Optical Communications

摘　　要：本文介绍用正、负光致抗蚀剂组合的方法,制造用于DFB激光器λ/4相移光栅的原理及工艺,并给出了研究结果和质量评价。光栅周期为4600A,相移转换区小于3μm。λ/4-shifted grating for DFB lasers has been successfully fabricated by the method of positive and negative photoresist. In this paper, the principle and fabrication process are described in detail, and the results and the quality evaluation are presented. The corrugation periods were about 4600A The quarter-wave phase shift transition width of the gratings were less than 3μm.

关 键 词：DFB 激光器 相移光栅 制造 抗蚀剂 

分 类 号：TN248[电子电信—物理电子学]