MOCVD气源输运技术研究  

Research on Technology of Gas Delivery System in MOCVD Equipment

作　　者：刘玉贵[1] 甘志银[1] 孙江平[1] 

机构地区：[1]华中科技大学机械科学与工程学院,湖北武汉430074

出　　处：《机械与电子》2014年第3期18-21,共4页Machinery & Electronics

摘　　要：利用GaN MOCVD设备的气源输运系统结构,分析了单稀释MO源管路和双稀释MO源管路的工作原理及特点,提出了MO源摩尔流量的计算公式和一种零死区管路设计方案;并且把管路压差控制和气体自动补偿技术应用到了MOCVD设备中。Use of GaN MOCVD equipment of air transport system seructure,the working princi- ple and characteristics of single dilution and double dilution pipe of MO source are studied. Then the calculation formulas of MO source molar flow and a design version of the pipe without dead space are presented. At last, the technology of pipeline pres- sure control and flow -automatic compensation are integrated into the MOCVD equipment.

关 键 词：MOCVD MO源管路 压差控制 气体 自动补偿 

分 类 号：TN305[电子电信—物理电子学]