Single-component chemically amplified i-line molecular glass photoresist based on calix[4]resorcinarenes  

作　　者：Juan Liu Zhengping Liu Liyuan Wang Haiyan Sun 

机构地区：[1]Beijing Key Laboratory of Energy Conversion and Storage Materials,College of Chemistry,Beijing Normal University [2]Kempur Microelectronics Inc

出　　处：《Chinese Science Bulletin》2014年第11期1097-1103,共7页

基　　金：supported by National Science and Technology Major Projects(2010ZX02303);the Fundamental Research Funds for the Central Universities

摘　　要：Calix[4]resorcinarene, prepared by the acidcatalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix[4]resorcinarene were partly protected by tert-butoxycarbonyl(t-BOC) and then esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride(2,1,4-DNQ-Cl). Upon irradiation to 365 nm light, the 2,1,4-DNQ groups undergo photolysis to generate a small quantity of sulfonic acid other than indene carboxylic acid. The generated sulfonic acid can further catalyze the deprotection of the t-BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. The lithographic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper.Calix[4]resorcinarene, prepared by the acid- catalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix[4]resorcinarene were partly pro- tected by tert-butoxycarbonyl （t-BOC） and then esterified with 2-diazo-l-naphthoquinone-4-sulfonyl chloride （2,1,4- DNQ-C1）. Upon irradiation to 365 nm light, the 2,1,4-DNQ groups undergo photolysis to generate a small quantity of sulfonic acid other than indene carboxylic acid. The gen- erated sulfonic acid can further catalyze the deprotection of the t-BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. The litho- graphic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper.

关 键 词：化学增幅 杯芳烃 单组分 光致抗蚀剂 玻璃 分子 正性光刻胶 间苯二酚 

分 类 号：O611.3[理学—无机化学]