有机分子束外延技术与研究进展  

TECHNIQUE AND RESERARCH PROGRESS OF ORGANIC MOLECULAR BEAM EPITAXY

作　　者：周淑琴[1] 刘云圻[1] 邱文丰[1] 朱道本[1] 

机构地区：[1]中国科学院化学研究所有机固体室,北京100080

出　　处：《物理学进展》2000年第4期395-406,共12页Progress In Physics

基　　金：国家自然科学基金;中国科学院"九五"重大基础研究基金的资助

摘　　要：本文介绍了超高真空分子束外延生长有机薄膜的技术及其研究进展 ,讨论了外延材料的纯化过程和杂质对外延薄膜结构的影响 ;从理论和实验观点评论了薄膜的生长性质和膜的有序结构。超高真空有机分子束外延技术是一种多用途的高技术 ,可以生长有机、无机、有机 /无机混和的薄膜结构。这种薄膜结构是未来光学和电子器件有希望应用的新一类工程材料。The paper is a review of technique and recent progress made in organic thin films grown in ultrahigh vacuum by organic molecular beam epitaxy techniques. The purification of source materials and the effects of impurities on organic thin films were also introduced. Both the natures of thin film growth and structural ordering from a theoretical and an experimental viewpoint have been discussed. Ultrahigh vacuum organic molecular beam epitaxy has been shown to be a highly versatile technique for the growth of a wide range of organic and hybrid organic/inorganic thin film structures which comprise a promising new class of engineering materials for optical and electronic device applications.

关 键 词：有机分子束外延 超高真空 有机薄膜 分子器件 

分 类 号：O484[理学—固体物理]