溅射Ar流量对Mn膜光学常数的影响  

Influence of Sputtering Ar Flux on the Optical Constants of Metal Manganese Film

作　　者：邵飞[1,2] 张晋敏[1,2] 唐华杰[1,2] 胡维前 谢泉[1,2] 卢顺顺 贺晓金 

机构地区：[1]贵州大学电子信息学院,贵阳550025 [2]贵州大学新型光电子材料与技术研究所,贵阳550025

出　　处：《材料导报》2014年第6期101-103,共3页Materials Reports

基　　金：国家自然科学基金(61264004);贵州省自然科学基金(黔科合J字[2013]2119);贵州省优秀教育科技人才省长基金(黔省专合字[2011]40);贵州省教育厅"125"重大科技专项项目(黔教育合重大专项字[2012]003);贵州省科技创新人才团队建设项目(黔科合人才团队(2011)4002);贵州省科技攻关项目(黔科合GY字(2011)3015)

摘　　要：采用可变入射角全自动椭圆偏振光谱仪,在能量2.0～4.0 eV范围内测量了磁控溅射法制备的金属Mn膜的光学常数,分析了氩气流量对Mn膜光学性质的影响.结果表明,在低能区,随Ar流量的增加,薄膜的所有光学常数均有不同程度的降低;而在高能区,流量对光学常数的影响不明显.薄膜复介电常数、折射率n随流量增大不断减小,在流量为15 mL/min后变化不明显;而消光系数k在流量为15～20 mL/min没有明显变化,在流量达到25 mL/min后消光系数显著减小.The optical constants of Mn films prepared by magnetron sputtering were measured by spectroscopic ellipsometry.The photon energy range was from 2.0 eV to 4.0 eV.The effects of sputtering Ar flux on optical constants of Mn films were analyzed.The results showed that the optical constants of Mn films decreased rapidly with Ar increasing within lower energy range,but the effects of Ar flux were no more obvious in higher energy range.The complex dielectric constant and refractive index decreased with Ar flux increasing,and no significant change when Ar flux was over than 15 mL/min.The extinction coefficient had no change when Ar flux was from 15 mL/min to 20mL/min,but decrease rapidly when Ar flux was over then 25 mL/min.

关 键 词：磁控溅射 锰薄膜 Ar流量 光学常数 

分 类 号：TN304[电子电信—物理电子学]