射频磁控溅射法制备TiSiN纳米复合涂层的结构与性能研究  

Characterization of Microstructures and Properties of TiSiN Coatings Deposited by RF Magnetron Sputtering

作　　者：赵永生[1] 李伟[2] 刘平[2] 马凤仓[2] 刘新宽[2] 陈小红[2] 何代华[2] 

机构地区：[1]上海理工大学机械工程学院,上海200093 [2]上海理工大学材料科学与工程学院,上海200093

出　　处：《真空科学与技术学报》2014年第3期245-250,共6页Chinese Journal of Vacuum Science and Technology

基　　金：上海市自然科学基金项目(11ZR1424600);上海市教委重点学科项目(J50503)

摘　　要：采用射频磁控溅射工艺在Si基体上制备了TiN/Si3N4纳米复合结构涂层。对不同溅射气压、基片温度以及N2/Ar气流比条件下制备的TiN/Si3N4纳米复合涂层的结构和性能进行了研究和分析。结果表明:溅射气压、基片温度和N2/Ar气流比对TiN/Si3N4涂层的断面结构和力学性能均有显著影响,当溅射气压为0.4 Pa、沉积温度为300℃、N2/Ar气流比为5∶38时,涂层可获得最大硬度为34.4 GPa。The TiN/Si3N4 nano-composite coatings were deposited by RF magnetron sputtering on silicon substrate. The impacts of the deposition conditions, such as the pressure, substrate temperature, ratio of N2 and Ar flow rates, and sputtering power, on the microstnlctures and mechanical properties were evaluated. The composite coatings were character- ized with X-ray diffraction, scanning electron microscopy and mechanical probes. The results show that the pressure, sub- strate temporature, and ratio of N2 and Ar flow rates significantly affect the microstmctures and mechanical properties. For example, synthesized under the optimized conditions： a pressure of 0.4 Pa,a substrate temperature of 3000C, and a ratio of 5/38, the coatings have the maximum hardness of 34.4 GPa, Possible mechanisms responsible for the improvement of its mechanical properties werealso tentatively discussed.

关 键 词：TIN Si3N4复合涂层 气压 温度 N2 Ar气流比 

分 类 号：TG174.4[金属学及工艺—金属表面处理]