不同沉积温度下非晶硅光学薄膜的光学特性研究  

Optical Character Study of Silicon Optical Films in Different Deposited Temperature

作　　者：罗海瀚[1] 蔡清元[1] 李耀鹏[1] 刘定权[1] 

机构地区：[1]中国科学院上海技术物理研究所,上海200083

出　　处：《光学学报》2014年第4期286-288,共3页Acta Optica Sinica

基　　金：中国科学院上海技术物理研究所创新专项(Q-DX-24);上海市自然科学基金青年项目(13ZR1463700)

摘　　要：光学薄膜的光学特性是薄膜设计与制备的基础。硅材料是红外光学薄膜中一种重要的高折射率材料。研究了在不同沉积温度下非晶硅光学薄膜的折射率和消光系数的变化。结果表明,在200℃时,硅薄膜折射率最大,消光系数随温度升高而减小。The optical character of optical thin films is the basis for the design and preparation of thin films. Silicon material is an important material of high refractive index at the infrared optical thin film. The changes of refractive index and extinction coefficient of amorphous silicon optical film in different deposition temperatures are studied. The results show that the silicon film has the maximum refractive index at 200 ℃, and the extinction coefficient decreases with temperature increases.

关 键 词：薄膜 非晶硅 光学特性 沉积温度 

分 类 号：O484.4[理学—固体物理]